Semiconductor thin films containing magnetic or plasmonic metal nanoparticles are key materials for the development of high-efficiency solar cells, bright light-emitting diodes, and next generation magnetoelectric devices. Nevertheless, harnessing the potential of this class of material requires resolving challenges related to their controlled synthesis on a large-scale.
Based on recent developments at Bielefeld University, Dr. Bahlawane and his collaborators have established a catalytically driven chemical vapor deposition (CVD)-metallization process for the growth of thin films of various technologically relevant metals and alloys at low temperatures. This highly selective process does not interfere with the growth of metal oxides and conciliates the deposition of metals with that of functional oxides.
This highly flexible synthesis method enables the rational design of metal-metal oxide 0-3D nanocomposite thin films and paves the way towards the development of multifunctional magnetic-optical and electrical devices, while using CVD: a standard industrial micro-fabrication technique.
The approach reported in Angewandte Chemie Int Ed, has enormous potential for the synthesis of immobilized nanoparticles of reactive and noble transition metals within the bulk of functional oxide thin films. The strategy provides reliable control parameters, enabling an accurate and flexible design of the film functionality.
This story is reprinted from material from Bielefeld University, with editorial changes made by Materials Today. The views expressed in this article do not necessarily represent those of Elsevier.