Applied Surface Science covers topics contributing to a better understanding of surfaces, interfaces, nanostructures and their applications. The journal is concerned with scientific research on the atomic and molecular level of material properties determined with specific surface analytical techniques and/or computational methods, as well as the processing of such structures.

This journal accommodates the following topics:

  • Surface science of catalysis, electrocatalysis and photocatalysis;
  • Deposition and growth;
  • 2D assembly;
  • Surface and interface modification by directed energy deposition (lasers, ion or electron beams) or other techniques such as plasmas;
  • Surface engineering and functionalization;
  • Functional surfaces and coatings;
  • Electrochemistry at surfaces and corrosion protection strategies;
  • Surface science applied to energy conversion and storage;
  • Surface nanotechnology and devices;
  • Semiconductors - surface and interface;
  • Biointerfaces.

Note to authors
In order to be considered for publication, your paper must be a research study on the atomic and molecular level of material properties determined with specific surface approaches, either by experimental techniques or computational methods. If not, your submission will not be considered for publication and will not be sent out for peer-review.

Benefits to authors
We also provide many author benefits, such as free PDFs, a liberal copyright policy, special discounts on Elsevier publications and much more. Please click here for more information on our author services.

Please see our Guide for Authors for information on article submission. If you require any further information or help, please visit our Support Center

Editorial board

Editor-in-Chief

  • H. Rudolph
    Fac. of Military Sciences (FMS), Netherlands Defence Academy, P.O. Box 90002, 4800 PA, Breda, Netherlands

Editors

  • S. Barcikowski
    Lehrstuhl für Technische Chemie I, Center for Nanointegration Duisburg-Essen (CENIDE), Universität Duisburg-Essen, Universitaetsstr. 7, 45141, Essen, Germany
  • M. Dinescu
    National Institute for Lasers, Plasma and Radiation Physics (INFLPR), 409 Atomistilor, RO 77125, Magurele-Bucharest, Romania
  • Q. Fu
    Dalian Inst. of Chemical Physics, State Key Lab. of Catalysis, Chinese Academy of Sciences (CAS), 457 Zhongshan Road, 116023, Dalian, China
  • G. Grundmeier
    Technische und Makromolekulare Chemie, Universität Paderborn, Warburger St. 100, 33098, Paderborn, Germany
  • W.-X. Huang
    Dept. of Chemical Physics, University of Science and Technology of China (USTC), 230026, Hefei, China
  • A. Juan
    Departamento de Fisica & IFISUR (UNS-CONICET), Universidad Nacional del Sur, Av. Alem 1253, 8000, Bahia Blanca, Argentina
  • P. Kingshott
    Fac. of Engineering & Industrial Sciences, Swinburne University of Technology, 543-454 Burwood Road, Hawthorn, VIC 3122, Victoria, Australia
  • T. Komeda
    Tohoku University, Inst. of Multidisciplinary Res. for Adv. Materials (IMRAM), 2-1-1 Katahira, Aoba-ku, Sendai-Shi, 980-8577, Japan
  • M.R. Linford
    Dept. of Chemistry and Biochemistry, Brigham Young University, C-310 BNSN, Provo, Utah, UT 84602, USA
  • S.-Y. Liu
    Hefei Natl. Lab. for Physical Science at Microscale, University of Science and Technology of China (USTC), PR 230026, Hefei, Anhui, China
  • C.F. McConville
    College of Science, Engineering & Health, RMIT University, 414-18 Swanston Street, Melbourne, 8006, Victoria, Australia
  • M.F. Montemor
    ICEMS-DEQ, Instituto Superior Técnico, Avenida Rovisco Pais, 1049-001, Lisboa, Portugal
  • R.L. Opila
    Dept. of Material Science and Engineering, University of Delaware, Dupont Hall 210, Newark, Delaware, DE 19716, USA
  • J. Perrière
    Inst. des Nanosciences de Paris, UMR CNRS 7588, Université Pierre et Marie Curie, Sorbonne Universités, 4 Place Jussieu, 75252, Paris, France
  • N. Pryds
    Dept. of Energy Conversion and Storage, Danmarks Tekniske Universitet (DTU), Building 779 - Frederiksborgvej 399, 4000, Roskilde, Denmark
  • M. Rocca
    Dept. of Physics, Università degli Studi di Genova, via Dodecaneso 33, 16146, Genova, Italy
  • P. Schaaf
    Inst. of Materials Engineering and Inst. of Micro- and Nanotechnologies, Technische Universität Ilmenau, Gustav-Kirchhoff-Str. 5, 98693, Ilmenau, Germany
  • Y. Shen
    School of Materials Science & Engineering, State Key Lab of New Ceramics & Fine Processing, Tsinghua University, 100084, Beijing, China
  • A. Teplyakov
    Dept. of Chemistry & Biochemistry, University of Delaware, Newark, Delaware, DE 19716, USA
  • J. Terry
    Dept. of Physics, Illinois Institute of Technology, 3101 S. Dearborn St., Chicago, Illinois, USA
  • R.M. Wallace
    Dept. of Materials Science and Engineering, University of Texas at Dallas, 800 W. Campbell Road, Richardson, Texas, TX 75080, USA
  • J. Whitten
    Dept. of Chemistry, University of Massachusetts at Lowell, Lowell, Massachusetts, USA
  • J. Yu
    State Key Lab. of Adv. Tech. for Mater. Syn. Proc., Wuhan University of Technology, Luoshi Road 122#, 430070, Wuhan, China

Advisory Editorial Board

  • K. Akimoto
    University of Tsukuba, Ibaraki, Japan
  • D.E. Aspnes
    North Carolina State University, Raleigh, North Carolina, USA
  • T.J. Bandosz
    City University of New York (CUNY), New York, New York, USA
  • A Bandyopadhyay
    Washington State University, Pullman, Washington, USA
  • B.N. Dev
    Indian Association. for the Cultivation of Science, Jadavpur, Kolkata, India
  • E. Fortunato
    Universidade Nova de Lisboa (Lisbon), Caparica, Portugal
  • C. Fotakis
    Foundation for Research & Technology - FORTH, Heraklion, Crete, Greece
  • Y. Gao
    University of Rochester, Rochester, New York, USA
  • J. Greeley
    Purdue University, West Lafayette, Indiana, USA
  • D.D. Gu
    Nanjing University of Aeronautics and Astronautics, Nanjing, China
  • S. Hofmann
    Max Planck Institut (MPI) für Metallforschung, Stuttgart, Germany
  • Y. Leterrier
    École Polytechnique Fédérale de Lausanne (EPFL), Lausanne, Switzerland
  • J. Lian
    Jilin University, Changchun, China
  • G. Lopinski
    Conseil national de recherches Canada (CNRC), Ottawa, Ontario, Canada
  • A. Miotello
    Università di Trento, Povo (Trento), Italy
  • R. Morent
    Universiteit Gent, Ghent, Belgium
  • A. Nakajima
    Tokyo Institute of Technology, Tokyo, Japan
  • J.W. Niemantsverdriet
    Cardiff University, Cardiff, Wales, UK
  • S.J. Pearton
    University of Florida, Gainesville, Florida, USA
  • E. Pincik
    Slovak Academy of Sciences, Bratislava, Slovakia
  • F. Rosei
    INRS-EMT, Varennes, Quebec, Canada
  • P. Schmuki
    Friedrich-Alexander-Universität Erlangen-Nürnberg, Erlangen, Germany
  • A. Shard
    National Physical Laboratory, Teddington, UK
  • C.Q. Sun
    Nanyang Technological University, Singapore, Singapore
  • X.W. Sun
    Nanyang Technological University, Singapore, Singapore
  • S. Suzer
    Bilkent University, Ankara, Turkey
  • H. Swart
    University of the Free State, Bloemfontein, South Africa
  • H.J.W. Zandvliet
    University of Twente, Enschede, Netherlands
  • W. Zheng
    Jilin University, Changchun City, China
  • L.V. Zhigilei
    University of Virginia, Charlottesville, Virginia, USA
  • H. Zuilhof
    WU Argrotechnology & Food Sciences, Wageningen, Netherlands