Broadening cognizance on atomically thin photocatalysts
Volume 43, Issue , Page 198–212
| Cheng-May Fung, Michell K.T. Chee, Jingxiang Low, Siek-Ting Yong, Siang-Piao Chai
Abstract: Photocatalysts with atomic dimensions exhibit superior performance in photocatalytic applications owing to their large surface-to-volume ratio, enormous surface active sites, and superior light-harvesting ability. The single-unit-cell thickness reduces interlayer charge transfer resistance, facilitating the rapid transfer of electrons and holes from the interior to the surface. This review aims to provide a comprehensive discussion on the fundamentals of photocatalysis and the advancements achieved from the evolution of photocatalysts from their bulk-counterpart to atomic dimensions. State-of-the-art techniques in designing and modifying atomically thin photocatalysts, such as defect engineering, impurity doping, facet engineering, and atomic-scale heterojunction construction, for diverse photocatalytic applications will be comprehensively elucidated.
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DOI: 10.1016/j.mattod.2020.10.034
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