Since its invention, silicon has been the predominant material of choice for semiconductors, and despite reaching the material’s physical limitations for both computing and power applications – where today’s applications require lithography feature sizes approaching the atomic limit for silicon in computing, and higher blocking voltages, switching frequencies, efficiency, & reliability in power, respectfully, we still haven’t adopted a new standard. That is, until now.

Diamond has always been known for its ability to diffuse heat and transmit large amounts of power through small quantities of the material—making it an ideal material for semiconductor application—but it has long been inaccessible due to high costs and absence of the material in mass quantities and appreciable sizes. However, due to extensive research and scientific advancements, we’ve developed a manufacturing process that enables us to produce these crystals at a cost-effective rate using methane gas and plasma as source materials. These wafer scale processes utilize chemical vapor deposition (CVD) reactors to form diamond in nanocrystals below 400?°C, enabling their integration with complementary metal oxide semiconductor (CMOS) devices, commercial display glass, and other materials previously precluded due to temperature sensitivity – creating the perfect diamond wafers needed for electronics.

With this process perfected, we now have the ability to create lab-grown diamonds at a steady rate to use within electronics, spanning from mobile phones to computers. We’re ushering in a new era of smaller, faster devices that is only possible with diamond technology.

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