Maskless lithography
Volume 8, Issue 2, Page 26–33
| Rajesh Menon, Amil Patel, Dario Gil, Henry I. Smith
The increasingly important role of maskless lithography in industry, research, and emerging applications in nanoscale science and engineering is discussed. The various forms of maskless lithography are reviewed with major emphasis on zone-plate-array lithography, a new paradigm that promises low cost and extendibility to the limits of the lithographic process.
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DOI: 10.1016/S1369-7021(05)00699-1
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