The IWDTF started in 1999, based on a domestic annual workshop on ultrathin silicon dioxide films. The 2013 IWDTF will focus on the science and technologies of dielectric films for electron devices, such as ultrathin SiO2, SiON, high-k dielectrics, and ferroelectric films.The electron devices include the memory, the power, the analog, the sensor, the display devices as well as the conventional logic devices.The topics on other technologies involved in the advanced gate stacks, which include metal gate electrodes and high-mobility channel materials, will also be discussed. Papers on both experimental and theoretical studies, for the deep understanding of the properties of dielectric films and their interfaces, are welcomed. The workshop will consist of invited and contributed talks, and poster presentations. Selected topics of current interests will be reviewed by several invited talks.

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