Chemical engineering enables the transformation of natural resources and energy into useful products for society. It draws on and applies natural sciences, mathematics and economics, and has developed fundamental engineering science that underpins the discipline.

Chemical Engineering Science (CES) has been publishing papers on the fundamentals of chemical engineering since 1951. CES is the platform where the most significant advances in the discipline have ever since been published. Chemical Engineering Science has accompanied and sustained chemical engineering through its development into the vibrant and broad scientific discipline it is today.

We welcome manuscripts presenting cutting-edge research, of either an experimental or a theoretical nature. While centered in chemical engineering, manuscripts will often have scope that cuts across disciplines, ranges across scales, from the molecular level to the plant level, with impact not only on specific research questions but also in global issues. Critical reviews of cutting-edge developments are also considered. Papers submitted to Chemical Engineering Science are assessed by the editorial board via a thorough peer-review process only with regard to their quality and potential for fundamental and long-lasting contribution to chemical engineering.

Chemical Engineering Science classifies research into the following main fields: Biochemical engineering, Materials synthesis and processing, Particle technology, Process systems engineering, Reaction engineering and catalysis, Separation processes, Thermodynamics and Soft Matter, and Transport Phenomena including Fluid Mechanics. Application areas covered by the journal include Chemicals, Minerals, Energy and Fuels, Water, Environment, Sustainability, Food, Medicine including Pharmaceuticals, and other areas to which chemical engineering applies.

Editorial board


  • Professor A.P.J. Middelberg
    Faculty of Engineering and Computer and Mathematical Sciences, The University of Adelaide, SA 5005, Australia

Executive Editors

  • Dr. N.G. Deen
    Technische Universiteit Eindhoven, Eindhoven, Netherlands
  • Professor A.G. Dixon
    Worcester Polytechnic Institute, Worcester, Massachusetts, USA
  • Professor M. Mazzotti
    Institute of Process Engineering, Zurich, Switzerland
  • Professor S. Nair
    Georgia Institute of Technology, Atlanta, Georgia, USA
  • Professor K. Sundmacher
    Max Planck Institut (MPI) für Dynamik komplexer technischer Systeme, Magdeburg, Germany
  • Professor C.H. Wang
    National University of Singapore, Singapore

Associate Editors

  • W. Ge
    Chinese Academy of Sciences (CAS), Beijing, China
  • J.L. Gong
    Tianjin University, Tianjin, China
  • V. Kalra
    Drexel University, Philadelphia, Pennsylvania, USA
  • S. Leong
    Singapore Institute of Technology, Singapore
  • R.P. Lively
    Georgia Institute of Technology, Atlanta, Georgia, USA
  • Z. Qi
    East China University of Science and Technology, Shanghai, China
  • M.S. Sakai
    The University of Tokyo, Tokyo, Japan

Managing Editor

  • Dr. R.P.S. Middelberg

International Advisory Panel

  • F.H. Arnold
    California Institute of Technology, Pasadena, California, USA
  • A.T. Bell
    University of California at Berkeley, Berkeley, California, USA
  • B. Biscans
    Laboratoire de Génie Chimique, Toulouse, France
  • A. Bommarius
    Georgia Institute of Technology, Atlanta, Georgia, USA
  • K. Carpenter
    Institute of Chemical & Engineering Sciences, Singapore, Singapore
  • M. O. Coppens
    University College London (UCL), London, England, UK
  • L. Gladden
    University of Cambridge, Cambridge, UK
  • R.J. Gorte
    University of Pennsylvania, Philadelphia, Pennsylvania, USA
  • Y. Kevrekidis
    Princeton University, Princeton, New Jersey, USA
  • D.-J. Lee
    National Taiwan University, Taipei, Taiwan
  • S.Y. Lee
    Korea Advanced Institute of Science and Technology (KAIST), Daejeon, The Republic of Korea
  • J. Li
    Chinese Academy of Sciences (CAS), Beijing, China
  • M.L. Lu
    University of Surrey, Guildford, Surrey, UK
  • W. Marquardt
    RWTH Aachen University (RWTH), Aachen, Germany
  • I.S. Metcalfe
    Newcastle University, Newcastle Upon Tyne, UK
  • F.J. Muzzio
    Rutgers University, Piscataway, New Jersey, USA
  • K.D.P. Nigam
    Indian Institute of Technology, Mumbai, India
  • R.W. Rousseau
    Georgia Institute of Technology, Atlanta, Georgia, USA
  • S. Skogestad
    Norwegian University of Science & Technology NTNU, Trondheim, Norway
  • D.N. Theodorou
    National Technical University of Athens (NTUA), Athens, Greece
  • M. Tirrell
    University of Chicago, Chicago, Illinois, USA
  • L.A.M. van der Wielen
    Delft University of Technology, Delft, Netherlands
  • R.T. Yang
    University of Michigan, Ann Arbor, Michigan, USA
  • W. Zimmerman
    University of Sheffield, Sheffield, UK